Paul's paper, Optical lithography using stimulated emission depletion, was co-authored by Sanjoy Mukherjee, Brandon Franz, Bryan Boudouris, Xiaolong He, Liang Pan, and Xianfan Xu.

Abstract:

Nanoscale three-dimensional lithography has run into a resolution limit governed by the diffraction limit. By looking towards a super-resolution microscopy technique for inspiration, three-dimensional lithography technologies can make use of STimulated Emission Depletion (STED) to break the resolution limit. Using a 532nm continuous wave laser as a depletion laser, STED is shown to provide control over the effective writing volume of the laser. Applications of STED in three-dimensional lithography are discussed.