ECE 59500 - Computational Lithography

Course Details

Lecture Hours: 1 Credits: 1

Areas of Specialization:

  • Microelectronics and Nanotechnology

Counts as:

Normally Offered:

Each Fall

Campus/Online:

On-campus and online

Requisites:

ECE 59500, Intro to Nanolithography and ECE 59500, EUV Lithography

Catalog Description:

This course is the third in a series of three 1-credit courses on semiconductor lithography. This course covers the specific aspects of computational lithography, including physics of sub-wavelength image formation; Fourier imaging at the diffraction limit; forward model for patterning simulations; and applications in manufacturing.

Required Text(s):

  1. Optical and EUV Lithography - A Modeling Perspective , Andreas Erdmann , SPIE Press , ISBN No. 9781510639010

Recommended Text(s):

None.

Learning Outcomes

A student who successfully fulfills the course requirements will have demonstrated an ability to:

  • Describe the physics of sub-wavelength image formation in a scanner by correctly invoking of the principles of Fourier optics
  • Explain how the physics of image formation can be captured into either an Abbe or a Hopkins mathematical model as well as explain which model is most appropriate depending on the use case.
  • Identify the four components that together are the basis for a forward computational model for the full patterning process and can describe how these models can be calibrated with experimental data.
  • Describe the three major applications of computational lithography in process development and mask making.
  • Give several detailed examples of the use of computational lithography in wafer manufacturing.

Lecture Outline:

Major Topics
1 Physics of sub-wavelength image formation
2 Fourier imaging at the diffraction limit
3 Forward model for patterning simulations (mask, optical, resist, etch)
4 Applications in mask data prep (SMO, OPC, LMC)
5 Applications in manufacturing (OVL/CD control, lens heating, target design, ...)

Assessment Method:

Quizzes, homework, discussions (12/2024)