Counts as:

• EE Elective
• CMPE Selective - Special Content

Normally Offered:

Spring - odd years

Campus/Online:

On-campus and online

Requisites:

MA 26500 or MA 26200

Requisites by Topic:

Linear algebra and basic geometrical optics

Catalog Description:

Upon completion of this course, students will thoroughly understand the process of optical system design and acquire the skills to carry out practical optical system design using widely used commercial design software (Zemax). This course will start with an overview of modern imaging systems and the introduction of the background knowledge points required for imaging system design. Next, we will provide systematic training for using the ray-tracing software (Zemax) to carry out practical imaging system design. The learning process involves both a theoretical understanding of the aberration of the imaging system and how to leverage design software to control and suppress the system aberration. To convert the basic design model to practical systems, we will discuss the practical aspects of imaging system design including the tolerance analysis, optomechanical integration, and the calibration and testing of imaging systems. Next, we will utilize these fundamental skills to analyze and design practical imaging solutions including camera systems and microscopic imaging systems. Finally, we will discuss the wave propagation method for analyzing high numerical aperture imaging systems.

Learning Outcomes:

1. A thorough understanding of the essence of imaging system design. [1]
2. an understanding of the aberrations in lens systems. [1]
3. an understanding of the principle and the limitation of ray tracing.. [1]
4. the ability to achieve aberration correction. [2]
5. an ability to design basic lenses. [2]
6. an ability to apply tolerance analysis. [2]
7. an ability to implement lens optimization. [2]

Lecture Outline:

Assessment Method:

Projects