Counts as:

• EE Elective
• CMPE Selective - Special Content

Normally Offered:

Each Fall, Spring, Summer

Campus/Online:

Online only

Requisites:

ECE 59500, Intro to Nanolithography

Catalog Description:

This course is the second in a series of three 1-credit courses on semiconductor lithography. This course covers the specific aspects of EUV lithography, which is currently the state-of-the-art in semiconductor patterning technology and used for the most critical layers of an integrated circuit. Like the first course, the emphasis will be on physical understanding, concepts, and applications. In addition - and unlike the first course, in this course there will also be optional learning material that delves deeper into the mathematical underpinnings of electromagnetic radiation and its application to imaging science and EUV lithography. This additional material is not required to pass the course but strongly recommended to work through to enhance the learning experience.

Learning Outcomes

A student who successfully fulfills the course requirements will have demonstrated:

• an understanding of the main steps in the history of the development of EUV
• an ability to solve simple problems related to electromagnetic radiation and waves using vector analysis
• an understanding of the difference between refractive and reflective imaging systems
• an ability to explain the function and operating principles of the sybsystems of an EUV scanner
• an ability to describe what's new about High NA EUV

Lecture Outline:

Assessment Method:

Quizzes, homework, discussions (12/2024)