MSE 690 Seminar Speaker Dr. Sunghwan Lee
Event Date: | March 25, 2019 |
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Time: | 3:45pm |
Location: | ARMS 1010 |
Priority: | Yes |
School or Program: | Materials Engineering |
College Calendar: | Show |
Abstract
Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface coating techniques for fabricating conductive and functional polymeric films. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices.
This talk will review the unique processing of functional CVD polymers and the mechanisms for the doping/dedoping and carrier transport that operates in technologically promising conjugated polymers and their integration into advanced optoelectronic and energy conversion devices such as organic solar cells and thin film transistors.
Biography
Dr. Sunghwan Lee is an assistant professor at Purdue University since January, 2019. Lee earned a doctoral degree (02. 2013) in Materials Science at Brown University. He spent two and a half years for his postdoctoral research at M.I.T and Harvard University. Before joining Purdue, he was with Baylor University, TX from 2015 to 2018 as an assistant professor. His current research focuses on the field of advanced processing of multi-functional materials and its device applications with the following key words: flexible electronics, functional nanostructured materials, microstructure evolution, energy conversion devices.