Intel's Silicon process technology with an emphasis on scaling electronic devices

Tuesday, July 21st
4:30-6:30pm
LWSN 1142
(Food provided. Bring resume)

Join Amy Occhialino, and TK Ramchandar for a discussion on Intel’s Silicon process technology with an emphasis on scaling electronic devices.

Amy Occhialino graduated from Northwestern University with a BS in Chemical Engineering in 1997 and immediately joined Intel. During her 17 year tenure she has worked across multiple high volume and TD manufacturing environments, from manufacturing through yield and process engineering. She received her MBA from Babson College in 2006 and is currently a dielectrics process engineering group leader in D1C. You can contact Amy at amy.r.occhialino@intel.com.

TK Ramchandar has been with Intel for more than 25 years and is currently an Engineering Area Manager with Intel Corporation’s Logic Technology Group (LTD) responsible for the development of advanced Diffusion and Thin Film processes. TK graduated from Wayne State University with a MS in Chem Engr. You can contact TK at t.k.ramchandar@intel.com

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