Performance Analysis of SiGe/Si core/shell NWFETs
Performance analysis of SiGe/Si core/shell NWFETs |
Abhijeet Paul, Saumitra Mehrotra, Mathieu Luisier and Gerhard Klimeck |
Objective:
- Performance assessment of SiGe nanowire FETs(NWFETs), ultra-scaledregime, next-gen CMOS solution.
Approach:
- Bandstructure: Virtual Crystal Approximation in TB (TB-VCA).
- Transport: Ballistic Virtual Source model.
- Performance metrics: Vinj,ION and intrinsic gate delay (tdelay).
Result:
- n/p-FETs better for higher Ge%.
- n-FETs with optimal Si shell thickness.
- pFETs with thinner Si shell and high-k.
- tdelay SiGe n-FETs 1.2 times greater than Si.
- tdelay SiGe p-FETs 1.25 times greater than Si.
Impact:
Work Published in IEEE, EDL, 31, 2010. doi: 10.1109/LED.2010.2040577
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Intrinsic gate delay (tdelay) in n-FETs with core thickness and Ge%.
Intrinsic gate delay (tdelay) in p-FETs with core thickness and Ge%.
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