Simulation of CV curves for biaxially strained SiGe pMOSFETs
Objective:
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Simulation of CV for bulk SiGe p-mosFETs and matching to experimental CV data.
Approach:
- Obtain bandstructure for SiGe using Tight-binding based VCA approach.
- Extract effective masses and band-offsets from TB calcualtions.
- Run self-consistent CV simulations.
Impact:
- Work published in IEEE, EDL, 2011.
DOI: 10.1109/LED.2010.2099101
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Results:
- Very good match with experimental CV curve for 3 different types of SiGe p-MOSFETs.
- Improvement in both performance and reliability shown due to improvement in transport hole effective mass and increase in hole tunneling current.
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