VLSI Technology Symposium 2019
VLSI Technology Symposium 2019
| Author: | Atanu Kumar Saha |
|---|---|
| Event Date: | June 9, 2019 |
Atanu Kumar Saha will be presenting his work on "Microscopic Crystal Phase Inspired Modeling of Zr Concentration Effects in Hf1-xZrxO2 Thin Films", in the 2019 Symposium on VLSI Technology being help at Kyoto, Japan.
Abstract:
In this work, we theoretically and experimentally investigate the Zr concentration dependent crystal phase transition of Hf1-xZxO2 (HZO) and the corresponding evolution of dielectric (DE), ferroelectric (FE) and anti-ferroelectric (AFE) characteristics. Providing the microscopic insights of strain induced crystal phase transformations, we propose a physics based model that shows good agreement with our experimental results for 10nm Hf1-xZxO2 (with x=0 through 1). Utilizing our model, we analyze HZO-FET operation as a nonvolatile memory device for different x.