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Ye, Peide "Peter"

Richard J. and Mary Jo Schwartz Professor of Electrical and Computer Engineering


-Atomic Layer Depostion (ALD)

ALD based nano-materials
ALD based nano-devices
ALD based nano-physics
ALD based nano-structures

  ECE 201 Linear Circuit Analysis
  ECE 255 Microelectronic Circuit Design

  ECE 659V High-Speed Semiconductor Device
  ECE 658   Semiconductor Material and Device Characterization
  EPICS (Engineering Project In Community Service)


News in ALD group


Group Picture Spring 2011

(We are missing Kun and Lin)


Group Picture Winter 2012

(We are missing Kun and Sami)

Group Picture Fall 2015
Group Picture Fall 2023





Postal Address: Purdue University
School of Electrical and Computer Engineering
465 Northwestern Ave.
West Lafayette, Indiana 47907-2035

Birck Nanotechnology Center
1205 West State Street
West Lafayette, Indiana 47907-2057

Office: BRK 1291 (Birck)  Primary
EE 252 (ECE)

Phone: Phone: 765.494.7611
Fax:     765.496.7443

E-Mail: yep@purdue.edu

Education: * BS, Fudan University, Shanghai, China, 1988
* Ph.D., Max-Planck-Institute for Solid State Research, Stuttgart, Germany, 1996

Background & Interests:

Semiconductor physics and devices, Nano-structures and nano-fabrications, Quantum/spin-transport, Atomic layer deposition, High-k/III-V and Ge device integration, High-performance III-V and Ge MOSFETs, High-k/2D integration, High-performance 2D devices, 2D spintronics, All oxide electronics, and wide bandgap semiconductor GaN and Ga2O3 power electronics.

Recent News in our ALD Group:

"IEEE Spectrum" magazine, the most prestigious one in electrical engineering society, publishes a long feature article about our break-through work on ALD high-k/InGaAs MOSFET. This article also reviews the history and current status of GaAs MOSFET research. PDF

Science quotes our breakthrough work on InGaAs MOSFET in its editorial article published on Feb. 20, 2009. PDF

Three papers on InGaAs MOSFETs (PDF), FinFETs (PDF) and GaAs interface studies (PDF) are accepted by IEDM 2009. Yanqing Wu's the first III-V FinFET work is selected as one of eight highlights for the coming IEDM.

The world first III-V FinFET gets wide interests from the device community:

Purdue News Press: http://www.purdue.edu/newsroom/research/2009/nov/091110YeFinfets.html

IEEE IEDM Press: http://btbmarketing.com/iedm/

IEEE Spectrum Press: http://spectrum.ieee.org/semiconductors/devices/first-galliumbased-finfets/0

National Science Foundation Highlights: http://www.nsf.gov/news/news_summ.jsp?cntn_id=115967


Peide Ye receives 2011 IBM Faculty Award.


Jiangjiang Gu's breakthrough work on world-first top-down gate-all-around (GAA) III-V nanowire FET got a lot of attentions from CMOS and nanoelectronics community after IEDM report.

Purdue News Press: http://www.purdue.edu/newsroom/research/2011/111206YeTransistors.html

IEEE Spectrum Press: http://spectrum.ieee.org/nanoclast/semiconductors/nanotechnology/ieee-meeting-plays-host-to-the-nanomaterials-that-aim-to-displace-silicon

Compound Semiconductor Press: http://www.compoundsemiconductor.net/csc/features-details.php?cat=news&id=19734345

Wikipedia: http://en.wikipedia.org/wiki/Multigate_device#cite_note-18


Peide Ye has been selected by a panel of distinguished professors at Purdue to be a University Faculty Scholar.


Jiangjiang's two papers on III-V GAA nanowire FETs are accepted by IEDM. They are "20-80nm Channel Length InGaAs Gate-all-around Nanowire MOSFETs with EOT=1.2nm and Lowest SS=63mV/dec" and "III-V Gate-all-around Nanowire MOSFET Process Technology: From 3D to 4D". The work is in close collaborations with Prof. Roy Gordon's group at Harvard University. 

Purdue New Press: http://www.purdue.edu/newsroom/releases/2012/Q4/new-4-d-transistor-is-preview-of-future-computers.html

Semiconductor Today: http://www.semiconductor-today.com/news_items/2012/DEC/PURDUE_211212.html


Peide Ye has been named IEEE Fellow in December 2012. He was honored for his contributions to compound semiconductor MOSFET materials and devices. IEEE Fellow is the highest grade of membership and is recognized by the technical community as a prestigious honor and an important career achievement.


Jiangjiang Gu wins 2012 SISC Ed Nicollian Best Student Paper Award



Heng Wu wins 2013 SISC Ed Nicollian Best Student Paper Award



Han Liu and Adam Neal's work on phosphorene starts to attract attention in nano-materials and nano-electronics communities:






Nature reports: Phosphorene excites materials scientists Papers\Nature_Phosphorene_2014.pdf

Science reports: Beyond Graphene Science 2015 Beyond Graphene

2015 Nature reports: 2D or not 2D 2015 Nature 2D Report

Phosphorene work is highlighted as one of 'Cutting edge chemistry in 2014" by Chemistry World/Royal Society of Chemistryhttp://www.rsc.org/chemistryworld/2014/12/cutting-edge-chemistry-2014-year-roundup

Three papers are accepted by VLSI 2014 including one Late News Paper. They are Heng Wu's "Ge CMOS: Breakthroughs of nFETs (Imax=714 mA/mm, gmax=590 mS/mm) by recessed channel and S/D" and Lin Dong's "III-V CMOS Devices and Circuits with High-Quality Atomic-Layer-Epitaxial La2O3/GaAs Interface". The Late News Paper is Lingming Yang's "High-Performance MoS2 Field-Effect Transistors Enabled by Chloride Doping: Record Low Contact Resistance (0.5kΩum) and Record High Drain Current (460 uA/um)" in collaborations with SEMATECH and Intel Cooperation.





Total five papers are accepted by IEDM 2014 including one co-authored with Shin and Prof. Alam. They are:

"First Experimental Demonstration of Ge CMOS Circuits" by Heng Wu et al.

"Deep Sub-100nm Ge CMOS Devices on Si with the Recessed S/D and Channel" by Heng Wu et al.

"Low Frequency Noise and RTN on Near-Ballistic III-V GAA Nanowire MOSFETs" by N. Conrad, M. Si, et al.

"Direct Observation of Self-heating in III-V Gate-all-around Nanowire MOSFETs" by Shin, et al.

"Towards High Performance 2D Black Phosphorus Optoelectronic Devices: the role of metal contact" by Yexin Deng et al.

Heng Wu's work on Ge CMOS starts to attract attention in electronics device community:http://www.purdue.edu/newsroom/releases/2014/Q4/germanium-comes-home-to-purdue-for-semiconductor-milestone.htmlhttp://www.technologyreview.com/news/533586/new-chip-points-the-way-beyond-silicon/

Heng Wu won the Best Student Paper Award for the 2014 Symposium on VLSI Technology, one of the two most competitive conferences in electronic device field.

Two IEDM papers are accepted by IEDM 2015. One is Heng's Ge nanowire CMOS and another is Jingyun and Mengwei's InGaAs nanowire with anisotropic etching.

Heng Wu won the Best Student Paper Award for the 2015 Device Research Conference, one of the competitive conferences in electronic device field.

IEEE Spectrum reports Heng Wu's Ge Nanowire CMOS work. PDFhttp://spectrum.ieee.org/semiconductors/devices/nanowire-transistors-could-let-you-talk-text-and-tweet-longer

In June 2016, Purdue trustee ratified Chair Professorship to Peide Ye as Richard J. and Mary Jo Schwartz Professor of Electrical and Computer Engineering. PDF

Two IEDM papers are accepted by IEDM 2016. One is Lingming's black phosphorus device paper in collaborations with TSMC and AFRL. Another paper is from Shin and Prof. Alam, co-authoring with us, on self-heating effect on floating body transistors. Congratulations!

Peide Ye has been elected Fellow of the American Physics Society (APS). The citation is "For contributions to scientific understanding and technical development of transistor technology on novel channel materials."

IEEE Spectrum published a new Feature Article on Germanium Transistor Technology written by Peide D. Ye. PDF



Hong Zhou made a breakthrough work on b-Ga2O3 membrane transistors with record drain currents for both E-mode and D-mode devices. http://www.semiconductor-today.com/news_items/2017/jan/purdue_110117.shtml

Peide Ye is the recipient of the 2017 CoE Faculty Award of Excellence in Research.

Peide Ye is the 2017 recipient of the Sigma Xi Research Award.

Peide Ye has been chosen as the 2018 Arden L. Bement Jr. Award recipient. As the top Purdue University research honors, the Bement Award is given for significant accomplishments in pure and applied science and engineering. Ye is being honored for his field-defining work in synthesizing and applying novel electronic materials to achieve record device performance.

Congratulations to Mengwei! His "Steep Slope Hysteresis-free Negative Capacitance MoS2 Transistors" work was published in "Nature Nanotechnology".

Congratulations to Gang Qiu! As the equal contributed first author, his "Field-effect transistors made from solution-grown two-dimensional tellurene" work was published in "Nature Electronics".

Congratulations to Wonil, Gang, Sami, Pai-Ying, Jinhyun and others ! We will present 6 papers at Device Research Conference this year including 1 invited talk, 2 oral talks and 3 poster presentations.

Congratulations to Wonil and Mengwei ! "First Direct Experimental Studies of Hf0.5Zr0.5O2 Ferroelectric Polarization Switching Down to 100-picosecond in Sub-60mV/dec Germanium Ferroelectric Nanowire FETs" work, in collaboration with NIST, was accepted by 2018 VLSI as a Late News paper.

Congratulations to Wonil! "First Demonstration of Ge Ferroelectric Nanowire FET as Synaptic Device for Online Learning in Neural Network with High Number of Conductance State and Gmax/Gmin" work, was accepted by 2018 IEDM.

IEEE Spectrum reports this new work for AI applications. https://spectrum.ieee.org/tech-talk/semiconductors/devices/searching-for-the-perfect-neuron-for-ai

Congratulations to Gang and Wonil for receiving 2019 Bilsland Fellowships !

Congratulations to Lyu Xiao and Mengwei! HfZrO2 scaling paper was accepted by VLSI 2019.

The editorial review of negative capacitance field-effect transistor was publihsed by Applied Physics Letters. PDF

Peide Ye and his colleagues at CEA-LETI and IBM Research published a review article in IEEE Spectrum August 2019 issue on "The Last Silicon Transistor" PDF

IEEE Spectrum Press:https://spectrum.ieee.org/semiconductors/devices/the-nanosheet-transistor-is-the-next-and-maybe-last-step-in-moores-law

Congratulations to Mengwei, Xiao and others! The papers on HZO sub-1ns polarization switch and In2Se3 ferroelectric semiconductor tunneling junction were accepted by 2019 IEDM.

Congratulations to Mengwei and all coauthors! The paper on a ferroelectric semiconductor transistor was accepted by Nature Electronics.

Purdue Press:https://www.purdue.edu/newsroom/releases/2019/Q4/reorganizing-a-computer-chip-transistors-can-now-both-process-and-store-information.html

Peide Ye is recognized as the Highly Cited Researchers among 6000 world wide in all fields.

Purdue Press:https://engineering.purdue.edu/ECE/News/2019/hcr-shalaev-ye-2019

Congratulations to Jingkai, Pai-Ying and all coauthors! The paper on tellurium atomic chains was published by Nature Electronics.

Purdue Press: https://www.purdue.edu/newsroom/releases/2020/Q1/dna-like-material-could-bring-even-smaller-transistors.html

Army Press: https://www.army.mil/article/232560/

Congratulations to Gang Qiu and all coauthors! The paper on the observation of Berry phase and Weyl fermions in n-type tellurene was published by Nature Nanotechnology.

Congratulations to Mengwei, Zehao and all coauthors! The paper on the scaling of ALD In2O3 transistors with drain current of 3.1 A/mm at drain voltage of 0.5 V was published by Nature Electronics.

Congratulations to Adam Charnas and all coauthors! The paper "Record RF Performance of Ultra-thin Indium Oxide Transistors with Buried-gate Structure" has been awarded the 2022 Device Research Conference Best Student Paper Award.

Congratulations to Dongqi, Zhuocheng, Pai-Ying and all co-authors! Four papers on ALD oxide semiconductors are accepted by IEDM 2022 including one collaborative paper leading by Mengwei's group.

Congratulations to Chang Niu, Jian-Yu Lin, Jie Zhang and all co-authors! Three papers on ALD oxide semiconductors are accepted by IEDM 2023.

Congratulations to Chang Niu, Zehao and all co-authors! The ultra-low contact resistance paper won the IEDM 2023 best student paper.