Skip navigation

John R Weaver II

John R Weaver II

Academic Consultant Purdue EPCOM

John Weaver serves as the Strategic Facilities Officer for the Birck Nanotechnology Center at Purdue University. He has been involved in cleanrooms and contamination control for 44 years, primarily in the semiconductor industry and the field of nanotechnology. His involvement spans initial planning, programming, design, construction, start-up, and operation of cleanrooms and other controlled environment facilities.

John has consulted internationally and domestically on facilities that range from clean-manufacturing (unclassified) facilities to ISO 3 cleanrooms for a wide variety of applications. In addition to his extensive experience in working with cleanroom facilities, he teaches industry short-courses on cleanroom design and construction.

He recently developed a college curriculum for nanotechnology facility design to be taught at American University of the Middle East in Kuwait.

John brings experience in both industry and the academe, having been involved in 30 cleanrooms and clean facilities. He has received numerous industry awards for his work and leaves a trail of highly successful facilities in his wake.

Specializations and Key Skills

  • Contamination-control needs analysis
  • Cleanroom planning and design
  • Semiconductor and nanotechnology processing expertise
  • Semiconductor and nanotechnology safety expertise
  • Clean-construction protocols
  • Cleanroom start-up and operation

Representative Examples of Engagement Experience

  • Led the owner team for the planning, design, construction, equipment installation, and startup of the Birck Nanotechnology Center at Purdue University, containing a 25,000 sq. ft. ISO 3 cleanroom and 25,000 sq. ft. set of characterization laboratories. Awarded Facility of the Year by Controlled Environments Magazine. Designed for advanced research.
  • Led the owner team for the planning, design, construction, equipment installation, and startup of the largest Class 10 cleanroom in the world (at that time) for a major automotive-electronics manufacturer. Designed for high-volume production.
  • Developed and implemented, in both domestic and international locations, an innovative design for clean- manufacturing facilities that can be readily implemented in shop-floor environments. Achieved a reduction of particle concentrations of two orders of magnitude at costs far less that cleanroom construction.

Education and Selected Awards

  • BS Chemistry – 1972 – Adrian College (Michigan)
  • Fellow, Institute of Environmental Sciences and Technology
  • Willis J. Whitfield Award for contributions to the field of Contamination Control
  • Monroe Seligman Award for contributions to Nanotechnology Facilities
  • Al Lieberman Mentoring Award
  • Two patents in semiconductor process development


  • Two books and three book chapters on cleanrooms, contamination control, and nanotechnology
  • Ten relevant journal publications
  • 24 short courses and workshops
  • 40 conference presentations
  • 7 specialty presentations
  • 5 on-line resources