MuGFET
Multi-gate field effect transistors (MuGFET) are field effect transistors with multiple gates. For example, double-gate, tri-gate, or gate-all-around structures are typical MuGFET structures. They are often called FinFET due to their fin-like structure. These structures have been suggested to the scientific community to overcome the limitation of the conventional single gate MOSFET, namely, the short channel effects (SCE). Since the superior electrostatic control on the channel can be achieved by introducing more than one gate, MuGFET is a strong candidate to replace the conventional MOSFET. Our group's research focus is on development of device simulators, characterization and optimization of the MuGFET structure, effects of disorder on transport properties of MuGFET, and exploration of various materials such as Silicon/Germanium or III-V materials. |
Major Projects in this area:
- Tri-Gate FinFETs
- SiGe/Si material for PMOS application
- Interface roughness scattering in nanowire FETs
- Drift diffusion simulator MuGFET
- Engineering nanowire n-MOSFETs at Lg < 8nm
- Atomistic simulation of phonon and alloy limited hole mobility in Si1-xGex nanowire
- Simulation Study of Thin-Body Ballistic n-MOSFET Involving Transport in Mixed Γ-L valleys
- Effect of Fin Tapering in Nanoscale Si FinFETs
Group member involved:
- Seung Hyun Park:
- Mathieu Luisier
- Abhijeet Paul
- Saumitra Mehrotra : Transport in ultra scaled devices based on Si/ SiGe / InGaAs / GaAs materials.
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Sung Geun