[BNC-grads-list] Barrel etcher in BNC clean room

Hsiao-Kuan Yuan hyuan at purdue.edu
Thu Aug 3 13:55:43 EDT 2006


Hi, Casey,
        Can we etch silica(CF3 gas) and photoresist (O2 gas) with this
etcher? Thank you.

-------------------------------------------------------------

Hsiao-Kuan Yuan
Purdue University
School of Electrical and Computer Eng.
Address: Box 545, EE building
         465 Northwestern Ave.
         West Lafayette, IN 47907-2035
Phone: office (765) 494-3501
e-mail: hyuan at purdue.edu     


-----Original Message-----
From: bnc-grads-list-bounces at ecn.purdue.edu
[mailto:bnc-grads-list-bounces at ecn.purdue.edu] On Behalf Of Casey Heaton
Sent: Tuesday, August 01, 2006 10:24 AM
To: bnc-grads-list at ecn.purdue.edu
Cc: hsharifi at purdue.edu; lubelski at ecn.purdue.edu
Subject: [BNC-grads-list] Barrel etcher in BNC clean room

The barrel etcher is now up. It is similar to the old barrel in EE but
not
enough so that people can just start running it, re-training will be
required. Unfortunately I do not as yet have any time scheduled for
training, this week is completely full with other commitments. If you
have
something that just can't wait then I'll try to find some time to train.
Hopefully Hasan will be back next week, he and I share responsibilities
and
this should free up time for training. Please be patient as we try to
accommodate training with the need to get other critical pieces of
equipment
up and running.  

Thank You,
Casey

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