[Bnc-facility-notice] NOTICE - Birck Nanotechnology Center PM Closure - Restricted Operations for Toxic & Bulk HP Gases

[Voorhis, Mark L.]

Dear Birck Research Community,

We are sorry for the delay announcement due to several unforeseen issues.  The preventive maintenance closure of the Birck Nanotechnology Facility has been completed. The cleanroom and laboratories are now open for limited operations.   Some equipment is still down for maintenance, or is in the process of being started back up.  Please check iLabs for individual equipment status.

Unfortunately the TGMS system will not be operational until future notice.  During this PM closure period the TGMS system was scheduled to have a hardware and software upgrade to completed by the end of this week.  The upgrade didn't go as planned and the engineering company overseeing the upgrade will be working through the weekend to evaluate the TGMS system.

Due to the TGMS upgrade setback the hazardous gases will not be unavailable until further notice.

Additionally the new microbulk tanks for Ar and Oxygen are still being debugged so Ar and O2 are only available in very limited quantities.  Using these gases in processing is prohibited until the microbulk tanks are online.


     *   ALD sources will remain available
        *   Unavailable gases:
           *   Ammonia (NH3)
           *   Boron trichloride  (BCl3)
           *   Chlorine (Cl2)
           *   Dichlorosilane  (H2Cl2Si)
           *   Hydrogen  (H2)
           *   Hydrogen Sulfide  (H2S)
           *   Krypton Fluoride  (KrF)
           *   Methane  (CH4)
           *   Nitric Oxide  (NO)
           *   Silane  (SiH4)
           *   Trichlorosilane  (HCl3Si)


        *   Tools affected:
           *   Reduced capability:
              *   PVD Nitride Sputtering System  (NH3 unavailable)
              *   Tube 1 Clean Ox  (H2 unavailable, dry oxidation only)
              *   Tube 4 Field OX  (H2 unavailable, dry oxidation only)

              *   Tube 7 General Oxidation  (H2 unavailable, dry oxidation only)
              *   Panasonic  (Cl2 and BCl3 unavailable)
              *   Plasma-Therm Apex SLR ICP RIE Etcher (H2, Cl2 and BCl3 unavailable)

           *   Shutdown:
              *   Axic PECVD  (NH3 & SiH4 unavailable)
              *   Easy Tube 3000 DVD  (CH4 unavailable)
              *   Epigress  (SiH4 unavailable)
              *   H2S CVD  (H2S & H2 unavailable)
              *   Nitric Oxide Anneal  (NO unavailable)
              *   Plasma-Therm Apex SLR HDPCVD  (SiH4 unavailable)
              *   Tube 2 Nitride  (NH3 and HCl3Si unavailable)
              *   Tube 3 LTO  (SiH4 unavailable)
              *   Tube 6 Polysilicon  (SiH4 unavailable)

Contact Steve Jurss (sejurss at purdue.edu<mailto:sejurss at purdue.edu>) with any questions regarding the TGMS system.

Mark Voorhis
Building Manager
Purdue University
Birck Nanotechnology Center
Office: (765) 494-3036


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