@article{1600salmani-jelodar2014, author = "Mehdi Salmani-Jelodar and S. Kim and K. Ng and Gerhard Klimeck", title = "Performance degradation due to thicker physical layer of high k oxide in ultra-scaled MOSFETs and mitigation through electrostatics design", year = "2014", note = "2014 IEEE Silicon Nanoelectronics Workshop (SNW), 8-9 June 2014, Honolulu, HI, Page(s): 1 - 2; doi:10.1109/SNW.2014.7348567", url = "http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=7348567", }