%0 Generic %D 2014 %T Performance Degradation due to Thick Physical Layer of High-k Oxide in Ultra- scaled MOSFETs and Mitigation through Electrostatics Design %A Salmani-Jelodar, Mehdi %A Kim, S. %A Ng, K. %A Klimeck, Gerhard %Z 2014 IEEE Silicon Nanoelectronics Workshop, Hilton Hawaiian Village, Honolulu, HI USA June 8-9, 2014