Prof. Xu’s laboratories house
state-of-the-art facilities including ultrafast laser systems and
characterization equipment. The majority of Prof. Xu’s research facilities
are located in the
- Three ultrafast laser systems used for energy transfer diagnostics, manufacturing, and materials synthesis
Pulse width as short as sub-10 fs, with Carrier Phase Envelop Stabilization
Two optical parametric amplifiers, wavelength tunable from UV to IR
Pump-and-probe lines for femtosecond time-resolved measurements
Spectrometer/CCD for time-resolved spectroscopy measurements
High precision femtosecond laser machining workstation
Temporal pulse shapers for pulse shaping and coherent control studies
Other equipment, such as single shot auto-correlator, lock-in amplifiers, shakers, etc.
- Veeco atomic force microscope (AFM), can be used for near-field scanning optical microscope (NSOM)
- Home-built AFM and NSOM with wavelength extended to near-IR (~ 1.8 mm)
- Nanolithography system using optical antenna array
- Chemical vapor deposition (CVD) system for growing silicon nanowires and carbon-based nanomaterials
- Nanosecond laser thermal reflectance measurement apparatus for measuring thermal conductivity and contact resistance
- Photoacoustic measurement apparatus for measuring thermal conductivity and contact resistance
- Computational facilities including small clusters in the group and access to Purdue central computational facility
Group members have access to the clean-room micro/nano fabrication and characterization facilities in the Purdue Birck Nanotechnology Center, including focused ion beam (FIB), electron beam lithography, SEM, and TEM.
Copyright © 2010, Prof. Xianfan Xu, Purdue University, all rights reserved.