John Weaver is recently retired from Purdue University, where he managed the Birck Nanotechnology Center facility, having led the planning, design, construction, startup, and operation of that facility. He has more than 45 years of experience in designing, building, and operating cleanroom facilities for the semiconductor industry, and more recently nanotechnology research facilities. His cleanroom experience ranges from ISO 3 (formerly known as Class 1) cleanrooms to controlled-environment facilities, having been involved in the design, startup, and/or operation of more than 30 of these facilities. A pioneer in safety considerations in both semiconductors and nanotechnology, his experience also includes semiconductor process development and high-volume semiconductor manufacturing.
John has received two patents, authored one book, three book chapters, and is a Technical Editor of the Journal of the IEST. He has presented tutorials and short courses, authored numerous technical papers and presentations, advised editorial staffs on overview articles, juried technical papers prior to publication, and written numerous in-house tutorial and technical publications. He is a member of the Senior Faculty of the Nanotechnology Institute of IEST.
John is a Fellow of the Institute of Environmental Sciences and Technology (IEST), Associate-Chair of SPC-7 (Nanotechnology), Chair of Working Group 205 (Nanotechnology Safety), and Vice Chair of the working group on nanocontainment devices. John served on the National Steering Committee of the NIOSH Prevention through Design initiative and as a reviewer of the NIOSH Strategic Plan for Nanotechnology. He has served as Principal Member of NFPA 318 Committee, Fire Standard for Cleanrooms, Fiscal Vice President and member of the Executive Board of the IEST, and has chaired the IEEE University-Government-Industry Micro/Nano Symposium and other cleanroom-related conferences. He is currently the Vice President for Strategic Planning for the IEST.
See John Weaver's Professional Profile