msepostdoc-list Polishing Lab Chemical Update

[Jennifer Louise Fifer]

Hi All,

I was asked to make a comment on the chemical SOPs. The etchant SOPs for ARMS 2132 do not require updates at this time unless notified otherwise.

I apologize for not adding this note to my original email.

Stay Safe,

Jenni Fifer
Safety & Mechanical Testing Lab Technician
Materials Science & Engineering
Purdue University
Phone: 765-494-9718
Email: fiferj at purdue.edu



From: Jennifer Louise Fifer
Sent: Tuesday, December 7, 2021 11:40 AM
To: Adams, Caitlin Jamie <cjadams at purdue.edu>; Britney N Bailey <baile261 at purdue.edu>; Clayton Stewart Barlow <barlow11 at purdue.edu>; Barnard, James Peter <barnardj at purdue.edu>; Saurav Basu <basu24 at purdue.edu>; Garrett William Behrje <gbehrje at purdue.edu>; Bidna, Gavin David <gbidna at purdue.edu>; Nor Fakhri Danial Bin Norazize <nnoraziz at purdue.edu>; Matthew L Binkley <mbinkle at purdue.edu>; Riordan A Boyle <boyle49 at purdue.edu>; Brandt, Olivia N <obrandt at purdue.edu>; MaiLan Bui Brown <brow1503 at purdue.edu>; Grant Robert Carnal <gcarnal at purdue.edu>; Ryan Edward Carr <carr94 at purdue.edu>; Rok Rweyemamu Cerne Jr. <rcerne at purdue.edu>; Tae Hoo Chang <chang466 at purdue.edu>; Chen, Ching-Chien <chen3785 at purdue.edu>; Harley Jaquette Clark <clark614 at purdue.edu>; Clement, Caleb Denton <clemen45 at purdue.edu>; Hannah N DeBoer <hdeboer at purdue.edu>; Abhijeet Dhiman <adhiman at purdue.edu>; Hannah Doyle <doyle87 at purdue.edu>; David Enrique Farache <dfarache at purdue.edu>; Fink, John Thomas <fink31 at purdue.edu>; Endrina S Forti <eforti at purdue.edu>; Hannah Nicole Fowler <fowlerh at purdue.edu>; Blair N Francis <franci13 at purdue.edu>; Kimberly Nicole Giannini <giannink at purdue.edu>; Matthew Francis Giroux <girouxm at purdue.edu>; Hugh Patrick Grennan <hgrennan at purdue.edu>; Corbin M Grohol <cgrohol at purdue.edu>; Park Gyuchul <park855 at purdue.edu>; Ryan Christopher Heavener <rheavene at purdue.edu>; Hernandez, Austin M <herna522 at purdue.edu>; Herring, John Francis <herring3 at purdue.edu>; David Samuel Ho <ho141 at purdue.edu>; Hoppenrath, Luke Anthony <lhoppenr at purdue.edu>; Duo Huang <huan1023 at purdue.edu>; Xinzhu Huang <huan1239 at purdue.edu>; Ziyun Huang <huan1318 at purdue.edu>; Abigail Ann Jachim <jachim at purdue.edu>; Kate F Jarvis <jarvis8 at purdue.edu>; Jo, Soungwan <jo46 at purdue.edu>; Shea K Jones <jone1573 at purdue.edu>; Adam Nathaniel Katz <katz21 at purdue.edu>; Koneru, Abbey Elizabeth <konerua at purdue.edu>; Ethan Christopher Korte <kortee at purdue.edu>; Jessica Lavorata <jlavorat at purdue.edu>; Diego A Leoni <dleoni at purdue.edu>; Weidong Liu <liu2568 at purdue.edu>; Yailuth Alexandra Loaiza Lopera <yloaizal at purdue.edu>; Jack Michael Lopez <lopez86 at purdue.edu>; Lu, Juanjuan <lu790 at purdue.edu>; Luktuke, Amey Avinash <aluktuke at purdue.edu>; Sean Michael MacPherson <smacphe at purdue.edu>; Devin Patrick Madigan <dmadigan at purdue.edu>; Ethan Johnson Mann <mann78 at purdue.edu>; Mann, Thomas R <mann104 at purdue.edu>; Tess D Marconie <tmarconi at purdue.edu>; Sae Matsunaga <smatsun at purdue.edu>; Ana Katharine McArdle <amcardl at purdue.edu>; Mikels, Keifer Riley <kmikels at purdue.edu>; Robert Edward Miller <mill2391 at purdue.edu>; Dane Otto Moebius <dmoebius at purdue.edu>; Debapriya Pinaki Mohanty <dmohant at purdue.edu>; Nagarpita Moka Vidyanag <nmokavid at purdue.edu>; Zara Moleinia <zmolaein at purdue.edu>; Karan Moti Motwani <kmotwan at purdue.edu>; Tyler Steven Muller <mullert at purdue.edu>; Katelyn Sarah Mullins <mullin21 at purdue.edu>; Anna Murray <murra191 at purdue.edu>; Zeynep Mutlu <zmutlu at purdue.edu>; Orta Guerra, Rodrigo <rortague at purdue.edu>; Ozer, Ali <ozera at purdue.edu>; Kezia Skye Starr Peck <peck28 at purdue.edu>; Xin Li Phuah <xphuah at purdue.edu>; Pibulchinda, Pattiya <ppibulc at purdue.edu>; Quentin Dwight Pitter <qpitter at purdue.edu>; Brhayan Stiven Puentes Rodriquez <bpuentes at purdue.edu>; Haozheng Qu <qu34 at purdue.edu>; Reger, Megan Rose <reger1 at purdue.edu>; James Ro <roj at purdue.edu>; Schrad, Caleb Matthew <schradc at purdue.edu>; Madeline K Schroeder <schro118 at purdue.edu>; Akul Nimish Seshadri <seshada at purdue.edu>; Shang, Anyu <shanga at purdue.edu>; Akshat Sharma <sharm318 at purdue.edu>; Qing Shen <shen441 at purdue.edu>; Shen, Chao <shen569 at purdue.edu>; Sinclair, Daniel R <sinclai3 at purdue.edu>; Kushagra Singh <singh500 at purdue.edu>; Ryan Parker Siu <siu2 at purdue.edu>; Dawson Michael Smith <smit3180 at purdue.edu>; Julia Ann Smith <smit3417 at purdue.edu>; Smith, Benjamin P <smit4180 at purdue.edu>; Somani, Abhishek <somani8 at purdue.edu>; Benjamin Thomas Stegman <bstegma at purdue.edu>; Brandon James Stewart <stewa263 at purdue.edu>; Stirrup, Kerry Ann M <kstirrup at purdue.edu>; Connor Daniel Sullivan <sulli256 at purdue.edu>; Tianyi Sun <sun821 at purdue.edu>; Talah Tayeb <ttayeb at purdue.edu>; Allison John Thornton <thornt21 at purdue.edu>; Lucas Allen Topliff <ltopliff at purdue.edu>; Shivam Tripathi <tripath6 at purdue.edu>; Jung-Ting Tsai <tsai92 at purdue.edu>; Tucker, Victoria Anne <vtucker at purdue.edu>; Ana Maria NA Ulloa Gomez <aulloago at purdue.edu>; Juan Carlos Verduzco Gastelum <jverduzc at purdue.edu>; Victor Gilles Wallemacq <vwallema at purdue.edu>; Ethan C Wang <wang3775 at purdue.edu>; Lauren M Washington <washin55 at purdue.edu>; Erich Weaver <weaver60 at purdue.edu>; Brandon J Wells <wells89 at purdue.edu>; Carson Davis Work <cwork at purdue.edu>; Yifan Wu <wu1394 at purdue.edu>; Pengyu Xu <xu1061 at purdue.edu>; Xu, Ke <xu1522 at purdue.edu>; Bo Yang <yang837 at purdue.edu>; Yang, Morris Menghuan <yang1991 at purdue.edu>; Di Zhang <zhan2923 at purdue.edu>; Zhang, Yizhi <zhan4094 at purdue.edu>; Bohua Peter Zhang <zhan4425 at purdue.edu>
Cc: MSE Safety <mse-safety at purdue.edu>; msefaculty-list at ecn.purdue.edu; msepostdoc-list at ecn.purdue.edu
Subject: Polishing Lab Chemical Update

Hi ARMS 2132 Researchers,

Good news! REM has approved us to use the following chemicals again:


*       Nitric Acid (You are still prohibited from making Nital. All Nital use must be from a commercially made solution.)

*       Hydrofluoric Acid (Note: You will not be given the key to the HF cabinet without your HF buddy and proper training.)

*       Perchloric Acid

*       Base Piranha Solution

At this time, the MSE Safety Committee plans to continue to keep all acids, oxidizers, and nital in the locked cabinets. You are still required to submit a hazard assessment (HA) and SDS/SOP in order access chemicals in these groups.

Stay Safe,

Jenni Fifer
Safety & Mechanical Testing Lab Technician
Materials Science & Engineering
Purdue University
Phone: 765-494-9718
Email: fiferj at purdue.edu<mailto:fiferj at purdue.edu>

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