[BNC-all] BNC News: Week of November 14th

[Abrol, Sangeeta Saddul]

Seminars /Workshops / Events / Announcement

Workshop:



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Announcement:

Attention to all sputtering users:

In early June of this year, we removed all access to the sputtering tools in the cleanroom due to lengthy lead times in obtaining replacement parts, as a precaution to help maintain the up-time of the tools.  As we have received the appropriate assortment of parts to perform maintenance on the tools as issues arise, we have decided to start opening up the tools to users once again.  Starting Monday, October 31st, the Metal/Dielectric sputter tool only will be once again available for training and use.  Since it’s been almost 5 months since anyone has used the tool, we have changed trained users’ access level to “Preliminary.”  When you want to use the tool, make a reservation during business hours (8AM to 5PM, Monday through Friday), and we will coordinate such that your first deposition will be supervised by a staff member, to act as a refresher training after not using the tool for so long.  Then, once it’s deemed appropriate to do so, users’ access will be restored to the normal level. Please contact Dave Lubelski and Dan Witter for questions and coordinating training and usage, and please check the tool’s wiki page for updated material availability and compatibility.  If the desired material isn’t installed, please let us know ahead of time so we can appropriately prepare the system.

Dan Witter


Dangerous Chemical Exposure Issue

It has been brought to our attention that user(s) have been working in the cleanroom without proper PPE. This may result in a serious injury!
You are required to wear the listed PPE when using an acid hood.

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[http://t0.gstatic.com/images?q=tbn:ANd9GcSJ8B8Hz8N3Ds6EKvq_wLZ8GHuCSR1cl77CAeLJODXMk2nDVYK9][49_252.jpg][Crews Headgear With Faceshield]<http://www.safetyglassesusa.com/crewsheadgear.html>
[clean room critical environment apparel][Emergency Safety Goggles]
                      +                +                            +                                 +


Required when using   HF, BOE
or anything containing TMAH



Failure to follow proper procedures will result in loss of access to facilities!

Stephen Jurss
Birck safety Manager


Chemical Use at Birck

Dear All –

We recently had an incident where H2O2 was stored on the BOE shelf in a chemical storage cabinet in the cleanroom.  The next user retrieved the H2O2 thinking it was BOE, and got a much different outcome from his etch.  So two reminders to our research community:

A.  Please store chemicals in the proper, labeled locations in our chemical storage cabinets.
B.  Double-check the labels on chemical bottles prior to using them in your process.

Thanks,
Ron



Dear Birck Research Community,

Recently we had an air handling situation whereby the heat and humidity in one of our lab wings was elevated due to an air handler being off-line for repair.  With the high heat and humidity in the lab wing it was necessary to open doors to the affected labs to try to promote some level of cooling from the hallway.  The air handler issue was fixed within a couple of days and the A/C returned to normal in the labs.

As a reminder, propping doors open is strictly against our policy under all normal conditions.  Additionally, entering a lab without swiping in with your own card is also strictly against our policies.  We rely on our card-swipe and equipment-use income to support and fund our operation.  Anyone who enters a lab without swiping their card, or who enters a lab using someone else’s card, or who knocks on a lab door and is admitted by someone already in the lab is falsifying use of the lab.  This will lead to disciplinary action up to and including dismissal from the university.  Please use your cards responsibly in our research facility.

Birck Management



Buffered Oxide Etch Concentration Change

We were notified by our BOE supplier, VWR, that they are discontinuing their 6:1 solution but will continue stocking & selling the 5:1 solution.  We have two cases left of the 6:1 but will start ordering the 5:1 for future use at Birck.  Please note the etch rate change per this comparison table:

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Safety:

Dear Birck Users,

Birck and Bindley are moving to an ANSI-compliant safety glasses policy in our labs.  What this means is that prescription glasses that aren’t ANSI Z87.1 compliant will no longer be allowed for work in Birck labs or the cleanroom.  Either ANSI-compliant safety glasses currently supplied to labs or ANSI-compliant prescription glasses are required to be worn to enter the laboratory. Verbal warnings will be issued to non-compliant users until September 1, 2022 after which more formal action will be taken.


Stephen Jurss
Birck Safety Manager



Dear Birck Users:

In an effort to comply with university policy and OSHA regulation Birck is making access to Safety Data Sheets available via QR codes located on the laboratory hoods.
Please be aware we are removing hardcopy binders from various locations throughout the facility. Please note: SDS’s will still be required with all chemical orders.

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Stephen Jurss
Birck Safety Manger



Birck Events<https://www.purdue.edu/discoverypark/birck/events/index.php> and Birck News<https://www.purdue.edu/discoverypark/birck/news/index.php>

https://www.nature.com/articles/s41598-022-19051-5

This is a Hosseini-Shakouri  collaboration studying the role of instability and correlation in nonlinear optical systems subject to feedback. The multimode correlation observed can be used to develop better imaging systems, potentially beyond classical boundaries.

Best,


Mahdi Hosseini, PhD
Assistant Professor, Elmore Family School of Electrical and Computer Engineering,
Assistant Professor, Physics and Astronomy (by Courtesy),
Birck Nanotechnology Center, BRK 2274


Research Positions:
Rahimi Lab
Birck Nanotechnology Center

Rahimi Lab<https://www.rahimilab.org/> has three research positions for graduate/undergraduate students over Fall 2022. One research area is wireless sensor design and implementation for biomedical and healthcare applications. The second research area is wireless soil sensors for precision agriculture applications.  These two positions are open for students in CS/ECE/BME with a background in RF characterization, PCB design, Arduino/nRF programming, and/or Antenna design and measurements. The third research area is laser-assisted manufacturing of wearable sensors.  This position is open for students with a background in CS/ECE/MSE with experience or interest in laser-assisted manufacturing processes.

The students will receive training and assistance on software, such as Altium and Arduino, and characterization equipment, such as a vector network analyzer. With guidance, the students will also perform antenna measurements in an anechoic chamber facility and in agricultural fields.  For manufacturing, students will get trained on laser engraving tools.

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Motivated students with prior experience in these areas are preferred. If interested, please email Prof. Rahim Rahimi (rrahimi at purdue.edu<mailto:rrahimi at purdue.edu>) with a brief explanation of your background and prior experience and an attached resume.

Rahim Rahimi, Ph.D.<https://engineering.purdue.edu/MSE/people/ptProfile?resource_id=116316>

Assistant Professor

School of Materials Engineering

Purdue University

Birck Nanotechnology Center BRK 2262
1205 West State Street
West Lafayette, Indiana 47907

Office: BRK 2262

Tel:  765 49-47716

 https://rahimilab.org/



[cid:image016.jpg at 01D8ED16.A2A27990]NSAC President : Alex Ozbolt (aozbolt at purdue.edu<mailto:aozbolt at purdue.edu>) or nsac at purdue.edu<mailto:nsac at purdue.edu>



NSAC Fab Forum
Tuesday @ 3.30pm

NSAC Coffee Hour
Friday @ 3.30pm

Birck Nanotechnology Center Advanced Capabilities
Plasma-Therm Apex HDPCVD SLR
(High Density Plasma Chemical Vapor Deposition)
Deposition Capabilities:
Silicon Dioxide (170°C, SiH4/O2/Ar)
Silicon Nitride (150°C, SiH4/N2/Ar)
Amorphous Silicon (170°C, SiH4/Ar)
Silicon Carbide (Future Capability)

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Features:
Lower Temperatures (10-170°C)
Ammonia-Free Nitride
Fast! (100nm/min SiO2)
Highly Automated (Load/Start/Unload)
600W Bias, 1000W ICP Power Supplies
4” Wafer Size
Location: Cleanroom R Bay
Contact: Rich Hosler (hosler0 at purdue.edu)<mailto:hosler0 at purdue.edu>
Please visit the Birck Wiki to learn about the wide array of fabrication and characterization equipment at the facility<https://wiki.itap.purdue.edu/display/BNCWiki/>



***To post an announcement in the weekly BNC E-news please send to Sangeeta Abrol @ abrols at purdue.edu***<mailto:abrols at purdue.edu***>


Follow us on Facebook and Twitter

[Facebook icon]<https://www.facebook.com/nano.purdue.edu/>    [Twitter icon] <https://twitter.com/BNCPurdue>

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