ECE 695E - Nanometer Scale Patterning and Processing
Course Details
Lecture Hours: 3 Credits: 3
Counts as:
Experimental Course Offered:
Spring 2007
Catalog Description:
Top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization. Survey of state-of-the-art nanofabrication techniques.
Course Objectives:
This course is intended for graduate students in science and engineering who are either i) interested in pursuing research in science & engineering at the nanometer length scale involving fabrication of materials, structures or devices, or ii) seeking the background necessary to understand and evaluate methods of top-down nanofabrication as needed for careers in microelectronic or the emerging nanotechnology industry.
Required Text(s):
None.
Recommended Text(s):
- Class Notes
- Submicron and Nanometer Technology , Henry I. Smith , NanoStructures Press
Lecture Outline:
Week | Topics |
---|---|
1 | Introduction to nanometer-structures technology and applications; top-down approach and bottom-up approach; Contamination control (classes of cleanrooms, etc.), Substrate cleaning |
2 | Adding materials for nanofabrication: spin-coating, evaporation (including lift-off), Chemical Vapor Deposition (CVD);Resist technology |
3 | Fourier optics and optical microscopy; Optical resolution. Spatial filtering and contrast in optical microscopy; |
4 | Optical systems for lithography: contact and near-field optical lithography, projection optical lithography; Laser interferometer technology. |
5 | Resolution enhancement techniques; Negative refraction and superlens effect. |
6 | Laser interference lithography and its application to periodic nanostructures, including negative index metamaterials and photonic crystals. Surfaceprofilometer and Atomic Force Microscopy (AFM); Ellipsometry. |
7 | Electro-optical systems for microscopy and lithography; Signals and noise in scanning-electron-beam systems. |
8 | Electron-beam lithography systems; Electron scattering and proximity effects |
9 | Introduction to the Vector Beam system in Birck Nanotechnology Center (including video and/or site visit). |
10 | Focused ion-beam lithography; Mask making; Maskless lithography. |
11 | Proximity x-ray lithography, electron and ion projection lithography, focused ion-beam lithography, proxiimal-probe lithography; embossing; Resolution, throughput and cost of future lithography tools. |
12 | Nanoimprint Lithography: thermal and step-and-flash. Soft-lithography. Registration and overlay techniques in lithography. |
13 | Removing materials: plasma basics, (deep) reactive-ion etch, sputter etch, ion-milling; West-etch; polishing and planarization. |
14 | More ways of adding materials: sputter deposition, electroplating, Atomic Layer Deposition (ALD) and epitaxy (lattice mismatch, critical thickness). |
15 | Technology Intelligence Case Study Presentations |
Assessment Method:
none