ECE 695T - Principles and Methods of Nanofabrication

Course Details

Lecture Hours: 3 Credits: 3

Counts as:

Experimental Course Offered:

Spring 2006

Catalog Description:

Description 1: Top-down and bottom-up approaches to the fabrication of nanoscale (<100 nm) features,. materials, and devices; limits of optical, electron and ion lithography; imprinting techniques; heteroepitaxy; synthesis of nanowires, nanotubes and quantum wires by heteroepitaxy and catalytic methods; nanoporous templates; nucleation and ripening theory applied to the gas-phase and colloidal synthesis of nanoparticles and quantum dots; strain- induced self organization of quantum dots by heteroepitaxy; fluidic sorting and assembly of nanotubes, nanowires and nanoparticles.
Description 2: This course focuses on the principles and methods of both top-down and bottom-up approaches to the fabrication of nanoscale (<100 nm) features, materials, and devices Specific topics include the limits of optical, electron and ion lithography; nanoimprinting and micromolding techniques, heteroepitaxy and the constraints of lattice mismatch, synthesis of nanowires, nanotubes and quantum wires by heteroepitaxy and catalytic methods, nanoporous templates for electrodeposition of nanowires, nucleation and ripening theory applied to the gas-phase and colloidal synthesis of nanoparticles and quantum dots, strain- induced self organization of quantum dots by heteroepitaxy, and fluidic sorting and assembly of nanotubes, nanowires and nanoparticles. Opportunities for discussion of the history, future, and societal impact of nanotechnology are provided throughout the semester.

Course Objectives:

This course is intended for graduate students in science and engineering who are either i) interested in pursuing research in science & engineering at the nanoscale involving fabrication of materials, structures or devices, or ii) seeking the background necessary to understand and evaluate methods of nanofabrication as needed to assess the potential impact of nanotechnologies.

Required Text(s):

None.

Recommended Text(s):

None.

Assessment Method:

none